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Video abstract of original research paper Electrosynthesized NiS2 thin films and their optical and semiconductor studies published in the open access journal Reports in Electrochemistry by Joseph Sahaya Anand, Rajes KM Rajan and Abdul Aziz Mohd Zaidan. Nickel sulfide thin films were prepared using electrodeposition on indium tin oxide-coated glass substrates. Films were characterized using X-ray diffraction for crystallographic analysis. The films were shown to be polycrystalline in nature with good uniformity. From scanning electron micrographs, the surface appeared to be comparatively granular with irregularly shaped grains. From optical analysis, the bandgap range was between 1.22 eV and 1.15 eV with an indirect bandgap nature. Mott-Schottky plot confirmed that the films were found to be n-type, and the semiconductor parameters of the film were derived. Read the original research paper here: http://www.dovepress.com/electrosynthesized-nis2-thin-films-and-their-optical-and-semiconductor-peer-reviewed-article